This year, 2007, a workshop, specifically designed for thin film characterization, will be held from September 3 to 4 at Hsinchu. The provided courses include characterizations of structure and mechanical properties, studies in interface between layers and substrate, and the production processes of thin films. The principals of X-Ray Reflection, Ellipsometry, TEM, Nanoindentation, and Atomic Layer Deposition will be discussed in the two-day courses.

After the workshop, the participants are encouraged to attend the 2007 APEC Nanoscale Measurement Forum held from September 5 to 7 at Taipei. The advanced developments in the fields of analytical and measurement methods on nanometer size will be presented and discussed in this forum. The topics include Standards for Nanotechnology, Nanotechnology in Semiconductor Industry, Metrology for Nanostructured Materials, Measurement and Characterization for CNT and Nanometrology Applied to Nanostructured Materials. Experts will be invited from worldwide economies such as Australia, Canada, China, Hong Kong, India, Indonesia, Japan, Korea, Malaysia, Thailand, US and local government, industries, and academies to share their development experience in these fields. There will be over 100 delegates coming overseas and locally to attend.