| Calibrated Device | Bulk Material, Thin Film Specimen |
|---|---|
| Range |
Displacement: 50 nm to 300 mm
Applied Force: 0.5 mN to 10 mN
|
| Uncertainty |
Indentation Hardness: 2.7 % (Relative)
Reduced Modulus: 3.1 % (Relative)
|
Calibration Capability
- 【N09】500 N Deadweight Force Calibration System
- 【N08】Micro Vickers Hardness Standard System
- 【N06】Rockwell and Superficial Rockwell Hardness Standard System
- 【N03】Force Calibration System (I)
- 【N04】【N05】Force Calibration System (II, III)
- 【N01】【N02】Deadweight Force Calibration System (I, II)
- 【O05】Spectrophotometric System
- 【O03】Spectroradiometric System
- 【O02】Total Luminous Flux System