NML & Tokuyama/Japan signed an agreement in January 2021, aiming to cooperate on the development of a new measurement technology of micro-particle in isopropyl alcohol (IPA) for advanced semiconductor processes. It shall benefit the particle impurity analysis in ultrapure reagent, which is helpful in finding the contamination sources and consequently can improve the manufacturing quality.

Dr. Tzeng-Yow Lin (left), on behalf of the NML, and Dr. Fumiaki Iwasaki (right), on behalf of Tokuyama, Corp., signed the joint development agreement via a virtual ceremony on 7 January 2021.