In response to the trend of the development of lithography technology in semiconductor industry, NML has focused on developing extreme ultraviolet (EUV) optical radiation measurement technology. The light sources and sensors in the EUV band are undoubtedly indispensable for the development of EUV-related technologies.

On 16 September, NML held the 2021 EUV Light Source and Sensing Application Webinar and invited three experts who have been engaged in the development of EUV equipment components. The speakers included P.G. Huang, CEO of Brightest Photonics Co., Ltd., Dr. Ya-Chin King, Professor of Electrical Engineering Department/Institute of Electronics Engineering, National Tsing Hua University, and Dr. Yi-Chen Chuang, Researcher of NML. It is expected that the webinar would attract more attentions on EUV-related technologies and facilitate the exchange and cooperation among domestic industry, academia, and research in related technical activities.