Due to the rapid development of semiconductor lithography technology, NML has established the first EUV spectral responsivity calibration system in Taiwan. This system includes a radiation measurement evaluation of EUV detectors to provide traceability for EUV standard detectors. This technology can be applied to the quantitative assessment of EUV exposure dose, enabling wafer manufacturers to better understand the actual exposure dose at the wafer processing site in exposure machines. It extends radiation measurement standards from UV to EUV. The newly developed optical radiation standard covers a wavelength range of 10 nm to 20 nm, meeting the EUV measurement requirements of current EUV lithography process inspection equipment in the semiconductor industry.