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【D22】Thin Film Measurement System

Calibrated Device 
(1) SiO2 Silicon Dioxide Standard Reference Materials (by Spectroscopic Ellipsometer)
(2) Thin Film Thickness Standards (SiO2, HfO2, Al2O3 Reference Materials) (by X-ray Reflectivity)
(3) SiOCH Porous Thin Film Standards (thickness: 2 nm to 200 nm) (by X-ray Reflectivity Porosimetry)
Range
(1) 1.5 nm to 1000 nm
(2) 1.5 nm to 200 nm
(3) Nominal pore diameter: 2.0 nm
Uncertainty 
(1) 0.10 nm
(2) 0.02 nm
(3) 0.3 nm
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  • Last Updated:2019/10/16
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