| Calibrated Device |
(1) SiO2 Silicon Dioxide Standard Reference Materials (by Spectroscopic Ellipsometer)
(2) Thin Film Thickness Standards (SiO2, HfO2, Al2O3 Reference Materials) (by X-ray Reflectivity)
|
|---|---|
| Range |
(1) 1.5 nm to 1000 nm
(2) 1.5 nm to 200 nm |
| Uncertainty | (1) 0.08 nm (2) 0.02 nm |