EUV Radiometry for Advanced Measurement and Calibration

Technical Introduction

In response to the development of advanced semiconductor lithography technology, NML has initiated the development of extreme ultraviolet (EUV) band optical radiation measurement and testing technology and has developed an radiometry solution for EUV photodetectors.

The technology includes a calibration system and spectral radiometry traceability chain, adopting a conical diffraction grating design, which greatly increases spectral efficiency. The measurement range of the EUV wavelengths is from 10 to 20 nm. The optical radiometry responsivity standard can be transferred to EUV photodetectors, thus satisfying the metrology demands of the EUV lithography ecosystem. Applying to the development of key components in the EUV lithography process, EUV photoresist analysis, and advanced semiconductor materials, the technology helps to enhance the further development of the semiconductor.

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Application Field

The EUV Radiometry for Advanced Measurement and Calibration can be applied to the development of key components in the EUV lithography process, EUV photoresist analysis, and advanced semiconductor materials. 

 

Contacts

Zhengxian Chen: Tel: 03-5919214; E-mail: ChrisCHChen@itri.org.tw